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Combustion chemical vapor deposition
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Combustion chemical vapor deposition : ウィキペディア英語版
Combustion chemical vapor deposition
Combustion chemical vapor deposition (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere.
== History ==
In the 1980s, initial attempts were performed to improve the adhesion of metal-plastic composites in dental ceramics using flame-pyrolytically deposited silicon dioxide (SiO2). The silicoater process derived from these studies provided a starting point in the development of CCVD processes. Subsequently, this process was constantly developed and new applications for flame-pyrolytically deposited SiO2 layers where found. At this time, the name "Pyrosil" was coined for these layers. Newer and ongoing studies deal with deposition of other materials (''vide infra'').

抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)
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